Main > PHOTORESIST > Polymer > Styrene Copolymer

Product Japan. W

PATENT ASSIGNEE'S COUNTRY Japan
UPDATE 03.00
PATENT ASSIGNEE Wako Pure Chemical Industries
PATENT CLAIMS Copolymer of
- Styrene (k units)
- CH2=CH-C6H4-OH (n units)
- CH2=CH-C6H4-O-CHMe-OMe (m units)
m,n > 1; k > 0; (m+k)/(m+n+k) = 0.1-0.9; k/(m+n+k) < 0.25 & polydispersity = 1-1.5
PATENT PHOTOCOPY Available on request

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