| PATENT ASSIGNEE'S COUNTRY | Belgium |
| UPDATE | 11.99 |
| PATENT ASSIGNEE | Agfa-Gevaert NV |
| PATENT CLAIMS | Light-sensitive AgX photographic material comprising a support & on one or both sides thereof at least one AgX emulsion layer & a protective antistress layer as an outermost layer, characterized in that AgX emulsion layer &/or protective layer comprises at least one zeolite loaded with a photographically useful group |
| PATENT PHOTOCOPY | Available on request |
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