Main > PHOTOGRAPHY > Antistatics > Polyoxyalkylene Compd

Product Belgium. A

PATENT ASSIGNEE'S COUNTRY Belgium
UPDATE 10.00
PATENT ASSIGNEE Agfa-Gevaert NV
PATENT CLAIMS Photographic AgX material which comprises a support & on one or both sides thereof at least one AgX emulsion layer & a protective antistress gelatin layer contg a synthetic clay wherein the said protective antistress layer or gelatin free antistatic afterlayer, coated over antistress layer comprises
- Polyoxyalkylene compd as antistatic agent
PATENT PHOTOCOPY Available on request

Want more information ?
Interested in the hidden information ?
Click here and do your request.


back