| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 12.99 |
| PATENT ASSIGNEE | Atotech USA Inc |
| PATENT CLAIMS |
A process of depositing a Cr oxide coating on a metal substrate comprising - Passing an electrically conductive substrate through a first Cr(III) bath contg a buffer agent & electrolytically depositing Cr on said substrate to obtain a Cr coated substrate follo wed by - Directly passing said Cr coated substrate into a second Cr(III) bath compn, said second Cr(III) bath contg said first Cr(III) bath buffer agent introduced into said second Cr(III) bath as dragout, said second Cr(III) bath compn compri sing a complexing agent for said buffer agent, in amount sufficient to increase the formation of Cr oxide coating, by complexing any of said buffer agent introduced into said second bath by dragout to minimize or eliminate any chrome deposition in said second Cr(III) bath, said second Cr(III) bath also comprising a Cr(III) compd, a weak chela ting agent, an optional conductivity enhancing cation, an optional depolarizer, & an optional surfactant - Electrolytically forming Cr oxide coating on Cr coated metal substrate |
| PATENT PHOTOCOPY | Available on request |
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