| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 08.99 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
Solvent cleaning process for cleaning rosin-based flux residue from semiconductor element surface which residue is formed under T > 210C solder reflow conditions comprising contacting the element with solvent compn contg - Alkoxy propionic acid ester having -OMe & -COOMe func tional groups |
| PATENT PHOTOCOPY | Available on request |
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