PATENT ASSIGNEE'S COUNTRY | Japan |
UPDATE | 06.99 |
PATENT ASSIGNEE | This data is not available for free |
PATENT CLAIMS |
Chemically amplified resist compn - Resin which has an acidic functional group protected by an acid decomposable group & which is converted into an al kali-soluble resin when the acid-decomposable protective group is decomposed - Photoacid generator which is a compd generating an acid by irradiation & selected of onium salts - Solvent which is mixt of an alkyl lactate with propylene gly col alkyl ether |
PATENT PHOTOCOPY | Available on request |
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