| PATENT ASSIGNEE'S COUNTRY | Japan |
| UPDATE | 06.99 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
Positive resist compn - Alkali-soluble phenol resin - Photosensitive ag. comprised of quinonediazide sulfonate of a polyhydroxy compd represented by formula (given) - |
| PATENT PHOTOCOPY | Available on request |
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