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Product Positive. Japan. N. No. 2

PATENT ASSIGNEE'S COUNTRY Japan
UPDATE 01.00
PATENT ASSIGNEE This data is not available for free
PATENT CLAIMS Resist compn comprising
- Polymer having groups cleavable by acid; wherein poly
mer having as groups cleavable by acid, groups contg
a substituted allyloxy group: CH2=CH-CX2-O-; X = halogen
- Compd which can forn acid upon exposure to active rays
PATENT PHOTOCOPY Available on request

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