PATENT ASSIGNEE'S COUNTRY | USA |
PATENT ASSIGNEE | Shipley |
PATENT CLAIMS |
Image forming method - Providing chemically amplified positive tone photoresist comprising resin binder, photoacid generator & aliphatic amine (not trialkylamine) having pKa < 9 & of sufficient basi city to complex with acid generated by exposure of photore sist to activating radiation - Forming a layer of the photoresist on substrate, exposing the photoresist layer to an image pattern of activating radia tion to liberate acid in the exposed areas of said photore sist layer & complex the same with the amine - Heating exposed photoresist layer to T sufficient to liberate a catalyzing amount of acid from the complex of acid & amine to create areas of differential soly., within photoresist layer & developing the heated exposed layer with a develo per for the photoresist layer to form photoresist relief image |
PATENT PHOTOCOPY | Available on request |
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